Average Reviews:
(More customer reviews)Before this book was published, Wolf & Tauber's book was the only good reference I had. Plummer's new book has a thorough review of basic principles, very well updated parts on current manufacturing equipments (Wolf's book also has extensive coverage in this respect). The best part in my opinion is oxidation & diffusion parts where the authors are one of the leaders in current research. The book not only focuses on the specific details, but also gives an integrated view of the whole CMOS fabrication process, which I enjoyed a lot.
I strongly recommend this book for students who want to learn basics of IC fabrication and also professional engineers who needs a good and well updated reference.
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Unique in approach, this book provides an integrated view of silicon technology--with an emphasis on modern computer simulation. It describes not only the manufacturing practice associated with the technologies used in silicon chip fabrication, but also the underlying scientific basis for those technologies. Modern CMOS Technology. Crystal Growth, Wafer Fabrication and Basic Properties of Silicon Wafers. Semiconductor Manufacturing--Clean Rooms, Wafer Cleaning and Gettering. Lithography. Thermal Oxidation and the Si/SiO2 Interface. Dopant Diffusion. Ion Implantation. Thin Film Diffusion. Etching. Backend Technology. For anyone interested in Fabrication Processes.
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